





Using the radius measurement method with the workpiece rotating, the system can measure and analyze functions such as cylindricity, roundness, straightness, coaxiality, concentricity, face run-out, total face run-out, perpendicularity, parallelism, and flatness. It can also analyze surface waviness, spectral analysis, wave height analysis, adjacent disc run-out, and inter-disc step differences.

Translation: This instrument employs the Cartesian coordinate measurement method with a stylus contact approach. It can measure the following dimensions, angles, tolerances, and generate auxiliary elements, as well as perform roughness and waviness analysis: Dimensions: Horizontal distance Vertical distance Linear distance Radius Diameter Angles: Horizontal angle Vertical angle Included angle Positional Tolerances: Parallelism Perpendicularity Form Tolerances: Straightness Flatness Circular profile Auxiliary Generation: Auxiliary points Auxiliary lines Auxiliary circles Roughness Analysis: Arithmetic mean height (Ra) Root mean square height (Rq) Maximum height of the profile (Rz) Peak height (Rp) Total height of the profile (Rt) Skewness (Rsk) Mean spacing of the profile elements (Rsm) Core roughness depth (Rc) Rz (DIN standard) R3z Rz (JIS standard) Maximum peak height (Rpmax) Maximum profile peak height (Rpm) Kurtosis (Rku) Root mean square height of the profile (Rdq/RΔq) Maximum profile valley depth (RδC) Material ratio at a specified section (Mr1, Mr2) Core roughness depth (Rpk) Valley depth of the core roughness (Rvk) Core roughness depth (Rk) Reduced peak height (Rdc) Amplitude parameters (A1, A2) Maximum profile height (Rx) Maximum profile height (AR) Core roughness depth (Rpc) Maximum roughness depth (Rmax) Rz (ISO standard) Profile height (4um) Maximum profile height (Ry) Waviness Analysis: Total waviness height (Wt) Arithmetic mean waviness height (Wa) Maximum waviness peak height (Wp) Maximum waviness valley depth (Wv) Root mean square waviness height (Wq) Core waviness depth (Wc) Kurtosis (Wku) Skewness (Wsk) Maximum waviness height (W) Maximum waviness height (Wx) Maximum waviness height (Wz) Mean spacing of the waviness profile elements (Wsm) Reduced peak height (Wdc) Total waviness height (Wte) Material ratio at a specified section (Wmr) Amplitude parameter (Aw) Material ratio curve (C(Wmr)) Material ratio at a specified section (Wmr(C)) Root mean square waviness height (Wdq/WΔq) Primary Profile Analysis: Total profile height (Pt) Arithmetic mean profile height (Pa) Maximum profile peak height (Pp) Maximum profile valley depth (Pv) Root mean square profile height (Pq) Core profile depth (Pc) Kurtosis (Pku) Skewness (Psk) Root mean square profile height (Pdq/PΔq) Mean spacing of the profile elements (Psm) Reduced peak height (Pdc) Material ratio at a specified section (Pmr(c)) Maximum profile height (Pz) Material ratio at a specified section (Pmr) Material ratio curve (C(pmr))



● Accuracy 2.0 + L/200 μm ● Linear motor + flying measurement ● Double telecentric double optical lens ● Automatic lifting optical system ● Support full-automatic detection line

● Accuracy min. 0.2 μm ● Linear motor ● Double telecentric double optical lens, 2300 W pixel CCD ● Automatic lifting optical system ● Support full-automatic detection line ● Available with laser and probe measurement

● High resolution/double telecentric double lens ● Measurement accuracy: ± 2.5 μm Cantilever + desktop structure, compact and stable, high precision, fast speed


